Foundry

Partial process foundry

Wafer 6-inch Silicon (JEITA)
Epitaxial n-type epitaxial
CVD Process LP-VCD, AP-CVD, Plasma-CVD, SiO2, TEOS, BPSG, SiN, Poly-Si, etc…
Thermal oxidation vertical furnaces/horizontal furnaces
Metal spatters:Al-Cu, Ti, TiN
CVD:W
Impurity diffusion P, B, As, Sb(SOG)
Photolithography i-line stepper
Planarization CMP: Only TEOS film, SOG interlayer film
Others Polyimide film, Trench Etcher, etc..

We also offer partial process foundry. All equipments are for 6-inch lines.